Research Facilities

Our research group is developing laboratory infrastructure for deposition and characterization of a wide variety of multi-functional thin film materials including ferroelectrics, dielectrics, superconductors, ferromagnets, and metals. All students in our group participate in building unique equipment for their research. This is a very important component of our mission.

Deposition The Gibbons group has established both physical and chemical routes for thin film deposition. We currently have a complete chemical solution deposition capability for a number of different material systems. We also have two rf/dc reactive magnetron sputter systems for metals and oxides. We have thermal evaporation capability for metal deposition. Finally, we have an ozone-assisted pulsed laser deposition facility.
Electrical Characterization The Gibbons group has a full suite of electrical characterization tools. Including HP LCR meters for dielectric measurements as a function of frequency and temperature and a Radiant Technologies RT66B for ferroelectric measurements (hysteresis, fatigue, C-V, etc.).
Structural Characterization The Gibbons group maintains a full structural characterization laboratory. This includes a Bruker D8 x-ray diffraction system with full 4-circle capability and a low/high temperature stage (LN2 to 1600C). Microstructural characterization can be undertaken in the OSU imaging facility (SEM/FIB, ESEM, TEM). A J.A. Woollam variable angle spectroscopic ellipsometer is available for optical property and depth profile analysis. And finally, the Gibbons group has an Asylum Research MFP-3D atomic force microscope with variable magnetic field, heating, piezoforce, and band excitation attachments.
Target Fabrication In collaboration with the Electroceramics Research Laboratory, the Gibbons group has access to facilities for 1 inch diameter sputter and PLD target fabrication. Standard powder preparation, milling, and sintering in numerous furnaces is available.
Device Processing The Gibbons group has access to the Oregon State University Class 1000 clean room. This is a 3000 square foot facility for the fabrication of electronic, magnetic, optical and microwave devices. Equipment for processing include systems for RF sputtering, ion beam sputtering, thermal and electron beam evaporation, activated reactive evaporation, plasma-enhanced chemical vapor deposition, reactive ion etching, rapid thermal processing, wet chemical processing, and photolithography.